论文标题

原子粗糙度在未补偿的Fe/COO(111)界面对交换偏置效应的影响

Influence of Atomic Roughness at The Uncompensated Fe/CoO (111) Interface on Exchange Bias Effect

论文作者

Wu, Rui, Xue, Mingzhu, Maity, Tuhin, Peng, Yuxuan, Giri, Samir Kumar, Tian, Guang, MacManus-Driscoll, Judith L., Yang, Jinbo

论文摘要

铁磁和抗铁磁层对交换偏差的界面粗糙度的影响尚不清楚。在此报告中,我们研究了(111)面向(111)个面向的抗铁磁COO膜的表面粗糙度对交换偏置的效果,并在顶部与铁磁fe成长。表面粗糙度通过原子尺度控制,在低于〜0.35 nm的范围内,通过COO膜的层厚度变化。可以观察到,交换偏置字段($ h_ {e} $)和强制性($ h_ {c} $)广泛地取决于与Fe膜接口处的COO(111)的原子尺度粗糙度(111)。发现了$ H_ {E} $和$ H_ {C} $在接口粗糙度上的相反依赖性,该依赖性归因于完全不补偿的COO(111)表面原子粗糙度引起的部分补偿的旋转状态,并使用Monte Carlo Simulations确认了。此外,发现$ h_ {c} $的起始温度低于封闭温度($ t_ {b} $)低约80 k,$ h_ {c} $的温度依赖性遵循的幂律,其关键指标等于一个,这表明在此系统中,$ h_ {c} $ of $ h_ {c}是$ h_ {c} $的interface $ h___________。

The effect of interface roughness of ferromagnetic and antiferromagnetic layers on exchange bias is still not well understood. In this report we have investigated the effect of surface roughness in (111)-oriented antiferromagnetic CoO films on exchange bias with ferromagnetic Fe grown on top. The surface roughness is controlled at the atomic scale, over a range below ~ 0.35 nm, by varying layer thickness of the CoO films. It is observed that both exchange bias field ($H_{E}$) and coercivity ($H_{C}$) extensively depend on the atomic scale roughness of the CoO (111) at the interface with Fe film. An opposite dependence of $H_{E}$ and $H_{C}$ on interface roughness was found, which was ascribed to partially compensated spin states induced by the atomic roughness at the fully uncompensated CoO (111) surfaces and was corroborated using the Monte Carlo simulations. Moreover, the onset temperature for $H_{C}$ is found to be up to ~ 80 K below the blocking temperature ($T_{B}$) and the temperature dependence of $H_{C}$ follows the power law with a critical exponent equal to one, which indicates that, in this system, $H_{C}$ is more of an interface-related property than $H_{E}$.

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