论文标题
石墨烯CVD生长在多晶镍的步骤中的石墨烯CVD生长研究
Operando atomic-scale study of graphene CVD growth at steps of polycrystalline nickel
论文作者
论文摘要
对多晶镍(Ni)表面(100)晶粒对石墨烯生长的作用是通过密度功能理论模拟补充的可变扫描隧道显微镜进行的。提供了对基板阶梯式区域的石墨烯膨胀过程的原子机制的清晰描述,这表明可以遵循不同的路线,具体取决于要越过的步骤的高度。当生长的石墨烯薄片达到单原子步骤时,它与下面的Ni层共同延伸。对于较高的Ni边缘,涉及步骤回收和石墨烯登录的不同过程变得活跃。在步骤束时,后一种机制导致了特殊的“楼梯形成”行为,其中在过度生长的石墨烯下具有相等宽度的梯田,这是由于C-NI键形成和碳层中的应力积累之间的能量成本的平衡驱动。我们的结果代表了在搜索新策略和方法中优化在多晶金属表面上优化化学蒸气沉积石墨烯的新策略和方法中迈出的一步。
An operando investigation of graphene growth on (100) grains of polycrystalline nickel (Ni) surfaces was performed by means of variable-temperature scanning tunneling microscopy complemented by density functional theory simulations. A clear description of the atomistic mechanisms ruling the graphene expansion process at the stepped regions of the substrate is provided, showing that different routes can be followed, depending on the height of the steps to be crossed. When a growing graphene flake reaches a monoatomic step, it extends jointly with the underlying Ni layer; for higher Ni edges, a different process, involving step retraction and graphene landing, becomes active. At step bunches, the latter mechanism leads to a peculiar 'staircase formation' behavior, where terraces of equal width form under the overgrowing graphene, driven by a balance in the energy cost between C-Ni bond formation and stress accumulation in the carbon layer. Our results represent a step towards bridging the material gap in searching new strategies and methods for the optimization of chemical vapor deposition graphene production on polycrystalline metal surfaces.