论文标题
高折射率对比度单模光学波导在尼橙锂上通过光刻辅助化学机械蚀刻（位置）制造的高导度波导
High-index-contrast single-mode optical waveguides fabricated on lithium niobate by photolithography assisted chemo-mechanical etching (PLACE)
论文作者
论文摘要
我们报告了在绝缘子（LNOI）上由SiO2层覆盖的绝缘体（LNOI）上的低损耗单模式波导的制造。我们的技术称为光刻辅助化学机械蚀刻（地点），依赖于铬膜通过飞秒激光微机械加工和随后的化学机械蚀刻液化的乳酸锂尼焦薄膜的化学机械蚀刻。高折射率对比单模式波导的传播损失为0.13 dB/cm。此外，为提高耦合效率而制造了波导锥度。
We report fabrication of low loss single mode waveguides on lithium niobate on insulator (LNOI) cladded by a layer of SiO2. Our technique, termed photolithography assisted chemo-mechanical etching (PLACE), relies on patterning of a chromium film into the mask shape by femtosecond laser micromachining and subsequent chemo-mechanical etching of the lithium niobate thin film. The high-index-contrast single mode waveguide is measured to have a propagation loss of 0.13 dB/cm. Furthermore, waveguide tapers are fabricated for boosting the coupling efficiency.
