论文标题

通过光学显微镜方法对薄INSE的厚度鉴定

Thickness identification of thin InSe by optical microscopy methods

论文作者

Zhao, Qinghua, Puebla, Sergio, Zhang, Wenliang, Wang, Tao, Frisenda, Riccardo, Castellanos-Gomez, Andres

论文摘要

作为一种新型的范德华分层半导体,硒化(INSE)由于其超薄极限,其出色的光学和电气性能引起了巨大的研究兴趣。在这里,我们讨论了四种不同的光学方法,以定量识别各种底物上的薄INSE薄片的厚度,例如SiO2/Si或透明聚合物底物。如果沉积在透明的底物上的薄INSE,则可以使用可见光谱的蓝色区域的薄片的透射率来估计厚度。对于由SIO2/Si支持的INSE,可以通过评估其表观颜色或使用基于菲涅尔律的基于菲涅尔律的光谱谱模型来估算薄片的厚度。最后,我们还研究了INSE光致发光发射能的厚度依赖性,该发射能提供了一个额外的工具来估计INSE厚度,并且在Sio2/Si上沉积在Sio2/Si和透明的聚合物基板上的INSE都起作用。

Indium selenide (InSe), as a novel van der Waals layered semiconductor, has attracted a large research interest thanks to its excellent optical and electrical properties in the ultra-thin limit. Here, we discuss four different optical methods to quantitatively identify the thickness of thin InSe flakes on various substrates, such as SiO2/Si or transparent polymeric substrates. In the case of thin InSe deposited on a transparent substrate, the transmittance of the flake in the blue region of the visible spectrum can be used to estimate the thickness. For InSe supported by SiO2/Si, the thickness of the flakes can be estimated either by assessing their apparent colors or accurately analyzed using a Fresnel-law based fitting model of the optical contrast spectra. Finally, we also studied the thickness dependency of the InSe photoluminescence emission energy, which provides an additional tool to estimate the InSe thickness and it works both for InSe deposited on SiO2/Si and on a transparent polymeric substrate.

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