论文标题

磁耦合和密度对STT-MRAM性能的影响

Impact of Magnetic Coupling and Density on STT-MRAM Performance

论文作者

Wu, Lizhou, Rao, Siddharth, Taouil, Mottaqiallah, Marinissen, Erik Jan, Kar, Gouri Sankar, Hamdioui, Said

论文摘要

作为MRAM的独特机制,设计内存阵列时需要考虑磁耦合。本文通过分析了STT-MRAMS内部和细胞间磁耦合,并研究了它们对MTJ设备的写入性能和保留的影响,MTJ设备是STT-MRAMS的数据存储元素。我们提供了MTJ设备的磁性测量数据,其直径范围从35nm到175nm,我们用来校准细胞内磁耦合模型。随后,我们推断了该模型以研究内存阵列中的细胞间磁耦合。我们提出了间间磁耦合因子PSI,以指示耦合强度。我们的仿真结果表明,PSI = 2%最大化磁耦合对设备性能的影响可忽略的阵列密度。较高的阵列密度显示平均切换时间的显着差异,尤其是在低切换电压下,这是由磁间磁耦合引起的,并取决于单元附近的数据模式。我们还观察到在间间磁耦合的影响下,数据保留时间的边缘降解。

As a unique mechanism for MRAMs, magnetic coupling needs to be accounted for when designing memory arrays. This paper models both intra- and inter-cell magnetic coupling analytically for STT-MRAMs and investigates their impact on the write performance and retention of MTJ devices, which are the data-storing elements of STT-MRAMs. We present magnetic measurement data of MTJ devices with diameters ranging from 35nm to 175nm, which we use to calibrate our intra-cell magnetic coupling model. Subsequently, we extrapolate this model to study inter-cell magnetic coupling in memory arrays. We propose the inter-cell magnetic coupling factor Psi to indicate coupling strength. Our simulation results show that Psi=2% maximizes the array density under the constraint that the magnetic coupling has negligible impact on the device's performance. Higher array densities show significant variations in average switching time, especially at low switching voltages, caused by inter-cell magnetic coupling, and dependent on the data pattern in the cell's neighborhood. We also observe a marginal degradation of the data retention time under the influence of inter-cell magnetic coupling.

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