论文标题

二元氧化物薄膜中铁电性和多效性的起源

Origin of ferroelectricity and multiferroicity in binary oxide thin films

论文作者

Glinchuk, Maya, Morozovska, Anna, Yurchenko, Lesya

论文摘要

二元氧化物薄膜中铁电,铁磁和铁弹性相的观察吸引了科学家和工程师的广泛兴趣。但是,对观察到的行为性质的理论考虑主要是针对第一原则的HFO2薄膜进行的,在Landau-Ginzburg-Devonshire(LGD)现象学方法中,在两种情况下都特别注意氧空位的作用。允许LGD理论的普遍性,我们将其应用于这项工作的二元氧化物组。该计算是在假设的假设中进行的,即由于缺陷位点诱导和/或表面诱导的反转对称性破坏(例如,通过电压电效应),可以将氧气空位作为弹性偶极子部分转化为电偶极子,并且可以“迁移”整个Ultra-thin-thin膜的深度。我们计算了膜极化对室温和不同膜厚度的施加电压的依赖性。由于许多二元氧化物的薄膜由于相同的氧空位而是铁电和铁磁,因此它们可以是多效应。执行的计算表明,二元氧化物的薄膜可以被视为新的宽类多精神分子,具有广泛的物理特性光谱,可用于在纳米电子和纳米技术中应用。可以通过选择氧空位浓度,膜厚度和特殊技术处理(例如退火)来控制这些性能。

The observation of ferroelectric, ferromagnetic and ferroelastic phases in thin films of binary oxides attract the broad interest of scientists and engineers. However, the theoretical consideration of observed behaviour physical nature was performed mainly for HfO2 thin films from the first principles, and in the framework of Landau-Ginzburg-Devonshire (LGD) phenomenological approach with a special attention to the role of oxygen vacancies in both cases. Allowing for generality of the LGD theory we applied it to the group of binary oxides in this work. The calculations have been performed in the assumption that oxygen vacancies, as elastic dipoles, can be partially transformed into electric dipoles due to the defect site-induced and/or surface-induced inversion symmetry breaking (via e.g. piezoelectric effect), and can "migrate" entire the depth of an ultra-thin film. We calculated the dependence of the film polarization on the applied voltage for room temperature and different film thickness. Since the many films of binary oxide are ferroelectric and ferromagnetic due to the same oxygen vacancies, they can be multiferroics. Performed calculations have shown that thin films of binary oxides can be considered as a new wide class of multiferroics with broad spectra of physical properties useful for application in nanoelectronics and nanotechnology. The properties can be controlled by the choice of oxygen vacancies concentration, film thickness and special technological treatment, such as annealing.

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