论文标题

X射线Ptychographic Tumographing,一种用于应变成像的新工具

X-ray ptychographic topography, a new tool for strain imaging

论文作者

Verezhak, Mariana, Van Petegem, Steven, Rodriguez-Fernandez, Angel, Godard, Pierre, Wakonig, Klaus, Karpov, Dmitry, Jacques, Vincent L. R., Menzel, Andreas, Thilly, Ludovic, Diaz, Ana

论文摘要

晶体材料中的应变和缺陷负责所需材料的独特机械,电和磁性特性,这使其研究成为材料表征,制造和设计的重要任务。现有的用于可视化应变场的技术,例如透射电子显微镜和衍射,是破坏性的,限于材料的薄片。另一方面,非破坏性X射线成像方法要么具有降低的分辨率,要么对广泛的应用不足。在这里,我们介绍X射线Ptychographic Tumographic Topugration,这是一种新的应变成像方法,并在微压缩后证明了其在INSB微柱上的使用,其中应变区域以30 nm的空间分辨率可视化。因此,X射线Ptychographic形象证明了自己是一种强大的非破坏性方法,用于对散装晶体标本内的应变场的成像,并具有几十纳米的空间分辨率。

Strain and defects in crystalline materials are responsible for the distinct mechanical, electric and magnetic properties of a desired material, making their study an essential task in material characterization, fabrication and design. Existing techniques for the visualization of strain fields, such as transmission electron microscopy and diffraction, are destructive and limited to thin slices of the materials. On the other hand, non-destructive X-ray imaging methods either have a reduced resolution or are not robust enough for a broad range of applications. Here we present X-ray ptychographic topography, a new method for strain imaging, and demonstrate its use on an InSb micro-pillar after micro-compression, where the strained region is visualized with a spatial resolution of 30 nm. Thereby, X-ray ptychographic topography proves itself as a robust non-destructive approach for the imaging of strain fields within bulk crystalline specimens with a spatial resolution of a few tens of nanometers.

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