论文标题
Au-HF薄膜的光学特性
Optical properties of Au-Hf thin films
论文作者
论文摘要
首次对金属间au $ _ {3} $ hf的薄膜的光学性质进行了首次研究，该薄膜首次研究了，在光学和近红外区域中显示了清晰的等离子性能，并具有负介电常数。与类似的合金（例如Au $ _ {3} $ Zr的胶片）相反，在大多数波长（370-1570 nm）中，胶片表达了更多负$ε'$值和较低的$ε'''$值。 Au $ _ {3} $ hf胶片是通过DC Magnetron在一系列沉积温度下（从室温到415 $^{o} $ C的范围制造的，并在不同的真空水平上退火。这些电影主要是作为Au $ _ {3} $ HF，AU $ _ {2} $ HF和AU $ _ {4} $ HF阶段组合的组合，当将低于400 $^{O} $ C的存放时，并且在400 $ _ {3} $ HF阶段以上均以400 $}的条件为sirtiation nir Indient in Indient in Indient of Airative at Indient in Indic presitation。当在10 $^{ - 8} $ torr退火时，这些电影是稳定的，但是当再次以10 $^{ - 6} $ torr退火时，将氧化的胶片氧化并变成了Auhf阶段的混合，这表明对氧化的耐药性可能是在高温温度下未经许可的应用的问题。
The optical properties of thin films of intermetallic Au$_{3}$Hf were experimentally investigated for the first time, which display clear plasmonic properties in the optical and near infrared region with negative permittivity. In contrast to similar alloys, such as films of Au$_{3}$Zr, the films express more negative $ε'$ values and lower $ε''$ values across most of the wavelengths (370-1570 nm) investigated. The Au$_{3}$Hf films were fabricated by DC magnetron sputtering at a range of deposition temperatures, from room temperature to 415$^{o}$C, and annealed at different vacuum levels. The films mostly formed as a combination of Au$_{3}$Hf, Au$_{2}$Hf and Au$_{4}$Hf phases when deposited below 400$^{o}$C, and exclusively Au$_{3}$Hf phase at above 400$^{o}$C, indicating key conditions for isolating this phase. The films were stable when annealed at 10$^{-8}$ Torr, but when annealed again at 10$^{-6}$ Torr the films oxidised and changed into a mix of Au- Hf phases, suggesting resistance to oxidization may be an issue for un-encapsulated applications at elevated temperatures.
