论文标题
p掺杂的2D-mos $ _2 $从空间原子层沉积中的金属氧化物的生长
Growth of p-doped 2D-MoS$_2$ on metal oxides from spatial atomic layer deposition
论文作者
论文摘要
在这封信中,我们报告了直接在Al $ _2 $ o $ $ _3 $的薄膜上,通过化学蒸气沉积的MOS $ _2 $的单层合成。合成的单层具有原子力显微镜以及共聚焦拉曼和光致发光光谱。我们的数据表明,2D材料的形态和特性取决于其在基板上的位置。靠近材料源,我们发现具有数百微米的边缘长度为0.3%的单个薄片,按$ n_e = 0.2 \ cdot 10^{13} $ cm $^{ - 2} $和对光亮度信号的主要贡献。与此相比,我们确定了下游的MM大小区域,该区域由密集的,小的MOS $ _2 $ Crystallites组成,边缘长度为几微米,直至纳米型机制,覆盖率超过70%。该纳米结晶层显示出仅<0.02%的应变,即能量为1.86 eV的光致发光发射,而Trion的贡献降低,并且似乎以$ N_H = 0.1 \ cdot 10^{13} $ cm $ cm $ cm $^{ - 2} $ n_h = 0.1 \ cdot = 0.1 \ d_h = 0.1 \ cdot = 0.1 hh = 0.1。在标准的CVD过程中实现的不寻常的P型掺杂,而无需取代掺杂,后处理或使用其他化学物质可能对应用有用。
In this letter we report on the synthesis of monolayers of MoS$_2$ via chemical vapor deposition directly on thin films of Al$_2$O$_3$ grown by spatial atomic layer deposition. The synthesized monolayers are characterized by atomic force microscopy as well as confocal Raman and photoluminescence spectroscopies. Our data reveals that the morphology and properties of the 2D material differ strongly depending on its position on the substrate. Close to the material source, we find individual flakes with an edge length of several hundred microns exhibiting a tensile strain of 0.3%, n-doping on the order of $n_e=0.2 \cdot 10^{13}$ cm$^{-2}$ and a dominant trion contribution to the photoluminescence signal. In contrast to this, we identify a mm-sized region downstream, that is made up from densely packed, small MoS$_2$ crystallites with an edge length of several microns down to the nanometer regime and a coverage of more than 70%. This nano-crystalline layer shows a significantly reduced strain of only <0.02%, photoluminescence emission at an energy of 1.86 eV with a reduced trion contribution, and appears to be p-doped with a carrier density of $n_h=0.1 \cdot 10^{13}$ cm$^{-2}$. The unusual p-type doping achieved here in a standard CVD process without substitutional doping, post-processing, or the use of additional chemicals may prove useful for applications.