论文标题
使用分子动力学模拟,揭示了金催化的锗生长的原子机制
Revealing atomistic mechanisms of gold-catalyzed germanium growth using molecular dynamics simulations
论文作者
论文摘要
蒸气液 - 固氧(VLS)方法被认为是合成锗(GE)纳米结构(例如纳米线)的合理技术,由于其独特的电子性能和与硅的内在兼容性,它们具有广泛的应用。然而,在VLS过程中仍然经常观察到结晶失败和物质缺陷,由于对高分辨率的原位特征的工具局限性,对其基本机制的理解不足。我们采用精确的原子间电位,适合于金峰(AU-GE)相图,我们进行了分子动力学模拟,以对GE晶体的Au催化生长过程进行系统研究。从模拟中,总体GE增长率与几个主要合成条件之间建立了关系,包括液体中的底物晶体学取向,温度和GE过饱和度。捕获了液化生长界面附近的GE原子的动力学行为,从中估计原子表面稳定性和汇率估计以量化生长的原子细节。这些界面特性与表面形态进一步相关,以解释观察到的方向依赖性生长模式。这项研究为对GE晶体的VLS生长机理的理解提供了新的光,并提供了为类似纳米材料设计创新合成方法的科学指南。
The vapor-liquid-solid (VLS) method is considered a plausible technique for synthesizing germanium (Ge) nanostructures (e.g. nanowires), which have a broad range of applications due to their unique electronic properties and intrinsic compatibility with silicon. However, crystallization failures and material defects are still frequently observed in VLS processes, with insufficient understanding of their underlying mechanisms due to instrumental limitations for high-resolution in-situ characterizations. Employing an accurate interatomic potential well fitted to the gold-germanium (Au-Ge) phase diagram, we performed molecular dynamics simulations for a systematic investigation on the Au-catalyzed growth process of Ge crystals. From the simulations, relationships were established between the overall Ge growth rate and several main synthesis conditions, including substrate crystallographic orientation, temperature and Ge supersaturation in liquid. The dynamical behaviors of Ge atoms near the liquid-solid growing interface were captured, from which the atom surface stability and exchange rate were estimated for quantifying the atomistic details of the growth. These interface properties were further linked to the surface morphologies, to explain the observed orientation-dependent growing modes. This study sheds new lights into the understanding of the VLS growth mechanisms of Ge crystals, and provides scientific guidelines for designing innovative synthesis methods for similar nanomaterials.