论文标题
通过H-BN封装固定化学吸附的氧分子,对2D半导体的缺陷钝化
Defect Passivation of 2D Semiconductors by Fixating Chemisorbed Oxygen Molecules via h-BN Encapsulations
论文作者
论文摘要
六角硼硝酸盐(H-BN)是各种二维(2D)范德华异质结构设备的关键要素,但是H-BN封装在与2D半导体内部缺陷有关的确切作用仍然不清楚。在这里,我们报告说,H-BN封装可以通过将化学吸附的氧分子稳定在单层WS2晶体的缺陷上,从而大大消除了与缺陷相关的间隙态。与理论分析相结合的电子能量损失光谱(EEL)清楚地证实,氧分子被化学成化学上的WS2晶体的缺陷,并通过H-BN封装固定在WS2和H-BN之间的界面上形成的氧气或皱纹。光谱研究表明,H-BN的封装阻止了各种激发和环境条件上氧分子的解吸,从而导致单层WS2晶体中大大降低和稳定的游离电子密度。与Bare WS2相比,这将抑制了两个数量级的激子歼灭过程。此外,在H-BN封装的WS2晶体中,山谷极化对各种激发和环境条件变得强大。
Hexagonal boron nitride (h-BN) is a key ingredient for various two-dimensional (2D) van der Waals heterostructure devices, but the exact role of h-BN encapsulation in relation to the internal defects of 2D semiconductors remains unclear. Here, we report that h-BN encapsulation greatly removes the defect-related gap states by stabilizing the chemisorbed oxygen molecules onto the defects of monolayer WS2 crystals. Electron energy loss spectroscopy (EELS) combined with theoretical analysis clearly confirms that the oxygen molecules are chemisorbed onto the defects of WS2 crystals and are fixated by h-BN encapsulation, with excluding a possibility of oxygen molecules trapped in bubbles or wrinkles formed at the interface between WS2 and h-BN. Optical spectroscopic studies show that h-BN encapsulation prevents the desorption of oxygen molecules over various excitation and ambient conditions, resulting in a greatly lowered and stabilized free electron density in monolayer WS2 crystals. This suppresses the exciton annihilation processes by two orders of magnitude compared to that of bare WS2. Furthermore, the valley polarization becomes robust against the various excitation and ambient conditions in the h-BN encapsulated WS2 crystals.