论文标题

铁磁CR1/3NBSE2外延薄膜中拓扑带交叉的签名

Signature of topological band crossing in ferromagnetic Cr1/3NbSe2 epitaxial thin film

论文作者

Saika, Bruno Kenichi, Hamao, Satoshi, Majima, Yuki, Huang, Xiang, Matsuoka, Hideki, Yoshida, Satoshi, Kitamura, Miho, Sakano, Masato, Hatanaka, Tatsuto, Nomoto, Takuya, Hirayama, Motoaki, Horiba, Koji, Kumigashira, Hiroshi, Arita, Ryotaro, Iwasa, Yoshihiro, Nakano, Masaki, Ishizaka, Kyoko

论文摘要

在插入的过渡金属二核苷(I-TMDC)中,过渡金属插入引入了磁相,在某些情况下会诱导拓扑带交叉。但是,在这种材料中,拓扑特性仍然难以捉摸。在这里,我们采用角度分辨的光发射光谱,以揭示外延生长的铁磁CR1/3NBSE2的带结构。 Weyl交叉的实验证据表明,CR1/3NBSE2是拓扑铁磁铁。这项工作强调了I-TMDC作为低维系统中磁性和拓扑物理相互作用的平台。

In intercalated transition metal dichalcogenides (I-TMDC), transition metal intercalation introduces magnetic phases which in some cases induce topological band crossing. However, evidence of the topological properties remains elusive in such materials. Here we employ angle-resolved photoemission spectroscopy to reveal the band structure of epitaxially grown ferromagnetic Cr1/3NbSe2. Experimental evidence of the Weyl crossing shows Cr1/3NbSe2 to be a topological ferromagnet. This work highlights I-TMDC as platform towards the interplay of magnetic and topological physics in low-dimensional systems.

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